Compact electron cyclotron resonance plasma source optimization for ion beam applications

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4576-4582

  O'Keeffe, Patrick ^a   Yamakawa, Kouji ^a   Mutoh, Harunobu ^a   Den, Shoji ^a   Hayashi, Yuzo ^a  

^a Irie Koken Co Ltd   (Japan)

Author keywords

ECR plasma; Ion beam; Microwave plasma; Permanent magnets

Indexed keywords

CURRENT DENSITY; DIAMOND FILMS; ELECTRIC CURRENT MEASUREMENT; ELECTRON CYCLOTRON RESONANCE; ION BEAMS; MAGNETIC FIELD EFFECTS; MICROWAVES; PERMANENT MAGNETS; PLASMA DENSITY; PLASMA PROBES;

ELECTRON TEMPERATURES; LANGMUIR PROBES; MICROWAVE PLASMAS;

PLASMA SOURCES;

EID: 0031176057     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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