Overview of greyscale photolithography for microoptical elements fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4984, Issue , 2003, Pages 111-117

  Cui, Zheng ^a   Du, Jinglei ^b   Guo, Yongkang ^b  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^b SICHUAN UNIVERSITY   (China)

Author keywords

Grayscale photolithography; Grey tone mask; Microlens; Microoptics

Indexed keywords

IMAGING TECHNIQUES; INTEGRATED CIRCUITS; PHOTOLITHOGRAPHY;

OPTICAL IMAGING;

MICROOPTICS;

EID: 0038734175     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.477831     Document Type: Conference Paper

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