New method to design half-tone mask for the fabrication of continuous micro relief structure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3680, Issue II, 1999, Pages 879-886

  Su, Jingqin ^a   Du, Jinglei ^a   Yao, Jun ^a   Gao, Fuhua ^a   Guo, Yongkang ^a   Cui, Zheng ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; COMPUTER SIMULATION; LIGHT MODULATION; MASKS; MICROSTRUCTURE; NONLINEAR OPTICS; PHOTORESISTS; SEMICONDUCTOR DEVICE STRUCTURES;

CONTINUOUS MICRO RELIEF STRUCTURES; GRAY-TONE MASKS; MICRO-OPTICAL ELEMENTS;

INTEGRATED OPTOELECTRONICS;

EID: 0032671211     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.341286     Document Type: Conference Paper

References (9)