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Volumn 2689, Issue , 1996, Pages 153-155

One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICAL ELEMENTS; GRAY LEVEL MASKS; HIGH ENERGY BEAM SENSITIVE GLASS; ION BEAM ETCHING; MASS PRODUCTION; ONE STEP LITHOGRAPHY; OPTICAL CONTACT ALIGNERS;

EID: 0029727645     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (40)

References (5)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.