One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2689, Issue , 1996, Pages 153-155

  Daschner, Walter ^a   Stein, Robert D ^a   Long, Pin ^a   Wu, Chuck ^a   Lee, Sing H ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICAL ELEMENTS; GRAY LEVEL MASKS; HIGH ENERGY BEAM SENSITIVE GLASS; ION BEAM ETCHING; MASS PRODUCTION; ONE STEP LITHOGRAPHY; OPTICAL CONTACT ALIGNERS;

COSTS; ELECTRON BEAM LITHOGRAPHY; ETCHING; FABRICATION; MASKS; OPTICAL GLASS;

DIFFRACTION GRATINGS;

EID: 0029727645     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)