MOCASEL: A total solution to electron beam lithography simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 494-505

  Cui, Zheng ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; INTEGRATED CIRCUIT MANUFACTURE; PHOTORESISTS; RADIATION EFFECTS; THERMAL EFFECTS;

SOFTWARE PACKAGE MOCASEL;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032672984     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (9)