Characterization of process-induced mobile ions on the data retention in flash memory

IEEE Transactions on Electron Devices

Volumn 50, Issue 4, 2003, Pages 995-1000

  Liou, Jimmy Jih Wei ^a   Huang, Chih Jen ^a   Chen, Hwi Huang ^a   Hong, Gary ^a  

^a UNITED MICROELECTRONICS CORPORATION   (Taiwan)

Author keywords

Data retention; Flash memory; Mobile ion; Plasma charging

Indexed keywords

ELECTRIC CHARGE; ELECTRON TUNNELING; IONIC CONDUCTION IN SOLIDS; PHOTOELECTRICITY; SECONDARY ION MASS SPECTROMETRY; SPUTTER DEPOSITION; THRESHOLD VOLTAGE; TITANIUM NITRIDE; ULTRAVIOLET RADIATION;

DATA RETENTION;

FLASH MEMORY;

EID: 0038494692     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2003.812081     Document Type: Article

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