Plasma charging and mobile ions on the data retention of 0.25μm FLASH memory

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 2001, Pages 72-75

  Jimmy Jih Wei Liou, ^a   Lin, P C ^a   Chen, W M ^a   Lin, J ^a   Huang, C J ^a   Chen, H H ^a   Hong, G ^a  

^a UNITED MICROELECTRONICS CORPORATION   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

IONS; NONVOLATILE STORAGE; PLASMA APPLICATIONS; ULTRAVIOLET RADIATION;

PLASMA CHARGING; WAFER PROCESSING;

FLASH MEMORY;

EID: 0034838079     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)