Micro-wear resistance of ultrathin silicon oxide film-covered polymer substrate

Surface Science

Volumn 532-535, Issue , 2003, Pages 1056-1060

  Hozumi, Atsushi ^a   Wu, Yunying ^b   Hayashi, Kazuyuki ^b   Sugimura, Hiroyuki ^b   Takai, Osamu ^b   Yokogawa, Yoshiyuki ^a   Kameyama, Tetsuya ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Chemisorption; Friction; Photochemistry; Silicon oxides

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; BINDING ENERGY; CHEMISORPTION; FRICTION; GLASS TRANSITION; HYDROPHOBICITY; PHOTOCHEMICAL REACTIONS; POLYMETHYL METHACRYLATES; SILICON COMPOUNDS; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

EXCIMER LAMPS;

WEAR RESISTANCE;

EID: 0038476530     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00447-3     Document Type: Conference Paper

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