Photo-induced synthesis of amorphous SiO2 film from tetramethoxy-silane on polymethylmethacrylate at room temperature

Journal of Non-Crystalline Solids

Volumn 215, Issue 2-3, 1997, Pages 176-181

  Awazu, Koichi ^a,b   Onuki, Hideo ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; EXCIMER LASERS; INFRARED SPECTROSCOPY; IRRADIATION; OXIDATION; PHOTOCHEMICAL REACTIONS; POLYMETHYL METHACRYLATES; REFRACTIVE INDEX; SILANES; SILICA; SILICON; SYNTHESIS (CHEMICAL);

PHOTO INDUCED SYNTHESIS; SIDE CHAIN SCISSION; TETRAMETHOXY SILANE;

AMORPHOUS FILMS;

EID: 0031548956     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00047-1     Document Type: Article

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