Micropatterned 1-alkene self-assembled monolayer on hydrogen-terminated silicon by vacuum ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 4 B, 2003, Pages 2534-2537

  Saito, Nagahiro ^a   Kadoya, Yutaka ^a   Hayashi, Kazuyuki ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

1 alkene; Hydrogen terminated silicon; Micropattern; Self assembled monolayer; Vacuum ultraviolet lithography

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HYDROGEN; LITHOGRAPHY; MICROSCOPIC EXAMINATION; OLEFINS; SELF ASSEMBLY; SILICON; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROGEN TERMINATED SILICON; MICROPATTERN; SELF ASSEMBLED MONOLAYER; VACUUM ULTRAVIOLET LITHOGRAPHY;

MONOLAYERS;

EID: 0038346793     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.2534     Document Type: Article

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