Microstructure evolution analysis in Co/Cu layers during the annealing process

Journal of Applied Physics

Volumn 93, Issue 8, 2003, Pages 4566-4575

  Su, Ming Horng ^a   Hwang, Chi Chuan ^b   Chang, Jee Gong ^c   Wang, Shi Hao ^b  

^a WUFENG INSTITUTE OF TECHNOLOGY   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^c NATIONAL CENTER FOR HIGH PERFORMANCE COMPUTING   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION; INTERFACES (MATERIALS); METALLIC FILMS; MICROSTRUCTURE; THERMODYNAMICS;

MICROSTRUCTURE EVOLUTION ANALYSIS;

GIANT MAGNETORESISTANCE;

EID: 0037965625     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1562010     Document Type: Review

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