Evolution of microstructure and magnetoresistance in Co/Cu multilayers during annealing

Journal of Magnetism and Magnetic Materials

Volumn 204, Issue 1, 1999, Pages 61-67

  Ratzke K ^a   Hall, M J ^a   Jardine, D B ^a   Shih, W C ^a   Somekh, R E ^a   Greer, A L ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COBALT; COPPER; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE MEASUREMENT; INTERDIFFUSION (SOLIDS); MAGNETIC PROPERTIES; MAGNETOMETERS; MAGNETORESISTANCE; MAGNETRON SPUTTERING; MICROSTRUCTURE; X RAY DIFFRACTION ANALYSIS;

GIANT MAGNETORESISTANCE; LOW ANGLE X RAY DIFFRACTOMETRY; STRUCTURAL CHANGES; VIBRATING SAMPLE MAGNETOMETRY;

MULTILAYERS;

EID: 0038802200     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(99)00448-5     Document Type: Article

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