Growth and characterization of boron carbon nitride films with low dielectric constant

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 1117-1121

  Tai, Tomoyoshi ^a   Sugiyama, Tomohiko ^a   Sugino, Takashi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Annealing; BCN film; Dielectric constant; Hg lamp irradiation

Indexed keywords

ANNEALING; CARBON NITRIDE; CHEMICAL BONDS; IRRADIATION; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SYNTHESIS (CHEMICAL);

CAPACITANCE-VOLTAGE CHARACTERISTICS;

POLYCRYSTALLINE MATERIALS;

DIAMOND;

EID: 0037846162     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00344-8     Document Type: Article

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