Formation of nanocrystals in BCN thin films deposited by radio-frequency PACVD

Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques

Volumn 87, Issue 3, 1996, Pages 170-174

  Loeffler, Jonathan ^a   Steinbach, Friedemann ^a   Bill, Joachim ^a   Mayer, Joachim ^a   Aldinger, Fritz ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTALS; ELECTRON ENERGY LOSS SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MIXTURES; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; SUBSTRATES; TERNARY SYSTEMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ARGON HYDROGEN MIXTURE; BORON CARBON NITROGEN COATINGS; DIMETHYLAMINE BORANE VAPOUR; ELECTRON SPECTROSCOPIC IMAGING; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; RADIO FREQUENCY PLASMA ASSISTED CHEMICAL VAPOUR DEPOSITION;

COATINGS;

EID: 0030104310     PISSN: 00443093     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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