Laser approaches for deposition of carbon nitride films - Chemical vapour deposition and ablation

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 577-581

  Popov, C ^a,b   Jelinek, M ^c   Ivanov, B ^d   Tomov, R I ^c,e   Kulisch, W ^a  

^a UNIVERSITY OF KASSEL   (Germany)

^b CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

^c INSTITUTE OF MATHEMATICS   (Czech Republic)

^d UNIVERSITY OF CHEMICAL TECHNOLOGY AND METALLURGY   (Bulgaria)

^e BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

Ablation; Laser; LCVD; Nitride

Indexed keywords

AMMONIA; AUGER ELECTRON SPECTROSCOPY; CARBON TETRACHLORIDE; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS LASERS; GRAPHITE; LASER ABLATION; NITRIDES;

CARBON NITRIDE; LASER-INDUCED CHEMICAL VAPOR DEPOSITION (LCVD);

AMORPHOUS FILMS;

EID: 0032614956     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00372-0     Document Type: Article

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