Rapid Prototyping of Masks for Through-Mask Electrodeposition of Thick Metallic Components

Journal of the Electrochemical Society

Volumn 148, Issue 5, 2001, Pages

  Wang, Wiehua ^a   Holl, Mark R ^a   Schwartz, Daniel T ^a  

^a University of Washington   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037679223     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1360187     Document Type: Article

References (20)

1. U. A. W. Telzlaff, Optimal Design of Flexible Manufacturing Systems, pp. 5-11, Physica-Verlag, Heidelberg (1990).
2. L. T. Romankiw, Electrochim. Acta, 42, 2985 (1997).
3. E. W. Becker, W. Ehrfeld, P. Hagmann, A. Maner, and D. Munchmeyer, Microelectron. Eng., 4, 35 (1986).
4. H. Guckel, T. Christenson, and K. Skrobis, J. Micromech. Microeng., 2, 225 (1992).
5. B. Lochel, A. Maciossek, M. Rothe, and W. Windbracke, Sens. Actuators A, 54, 663 (1996).
6. A. B. Frazier and Mark G. Allen, J. MEMS, 2, 87 (1993).
7. Y. Xia and G. M. Whitesides, Angew. Chem. Int. Ed. Engl., 37, 550 (1998).
8. R. J. Jackman, S. T. Brittain, and G. M. Whitesides, J. MEMS. 7, 261 (1998).
9. R. J. Jackman and G. M. Whitesides, CHEMTECH, 5, 18 (1999).
10. C. Marques, Y. M. Desta, J. Rogers, M. C. Murphy, and K. Kelly, J. MEMS, 6, 329 (1997).
11. A. D. Feinerman, R. J. Lajos, V. White, and D. D. Denton, J. Microelectromech. Syst., 5, 250 (1996).
12. S. C. Jacobsen, D. L. Wells, C. C. Davis, and J. E. Wood, in Microelectromechanical Systems, p. 45, IEEE, New York, NY (1991).
13. A. Cohen, G. Zhang, F. Tseng, U. Frodis, F. Mansfeld, and P. Will, in Technical Digest of 12th IEEE International Microelectromechanical Systems Conference. IEEE (1999).
14. P. F. Jacobs, Stereolithography and Other RP&M Techniques, pp. 4-15, ASME Press, New York (1996).
15. S. D. Leith, S. Ramli, and D. T. Schwartz, J. Electrochem. Soc., 146, 1431 (1999).
16. J. I. Goldstein, D. E. Newbury, P. Echlin, D. C. Joy, A. D. Romig, Jr., C. E. Lyman, C. Fiori, and E. Lifshin, Scanning Electron Microscopy and X-Ray Microanalysis, pp. 395-448, Plenum Press, Inc., New York (1992).
17. E. C. Harvey, P. T. Rumsby, M. C. Gower, and J. L. Remnant, in Micromachining and Microfabrication Process Technology, p. 266, SPIE. Bellingham, WA (1995).
18. M. A. Roberts, J. S. Rosier, P. Bercier, and H. Girault, Anal. Chem., 69, 2035 (1997).
19. C. R. Yang, B. C. S. Chou, H. Y. Chou, F. H. H. Lin, W. K. Kuo, R. K. S. Luo, J. W. Chang, and Z. J. Wei, in Micromachining and Microfabrication Process Technology IV, p. 342, SPIE, Bellingham, WA (1998).
20. S. D. Leith and D. T. Schwartz, J. Micromech Microeng., 9, 97 (1999).