Microcoils fabricated by UV depth lithography and galvanoplating

Sensors and Actuators, A: Physical

Volumn 54, Issue 1-3, 1996, Pages 663-668

  Lochel B ^a   Maciossek, A ^a   Rothe, M ^a   Windbracke, W ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

Electrodeposition; Microcoils; Photoresist; Thick layers; UV patterning

Indexed keywords

EID: 5644247506     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)80034-9     Document Type: Article

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