In-situ fabrication of sacrificial layers in electrodeposited NiFe microstructures

Journal of Micromechanics and Microengineering

Volumn 9, Issue 1, 1999, Pages 97-104

  Leith, Steven D ^a,b   Schwartz, Daniel T ^a  

^a University of Washington   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACETIC ACID; CHLORINE COMPOUNDS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRODEPOSITION; ELECTROLYTES; ETCHING; LAYERED MANUFACTURING; METALLIC FILMS; METALLOGRAPHIC MICROSTRUCTURE; NICKEL ALLOYS; STRUCTURE (COMPOSITION);

ACID ETCHING; GLACIAL ACETIC ACIDS; NICKEL RICH MATRIX; PLANAR FILMS; POTENTIAL CONTROLLED ETCHING TECHNIQUE; PULSE ELECTROLYTE AGITATION SCHEME; SACRIFICIAL LAYERS;

IRON;

EID: 0033100771     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/9/1/313     Document Type: Article

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