Warming potential reduction of C4F8 using inductively coupled plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 1, 2003, Pages 280-285

  Raju, Ramasamy ^a,b,c   Kudo, Daisuke ^b   Kubo, Yuya ^a   Inaba, Tsuginori ^a   Shindo, Haruo ^b  

^a CHUO UNIVERSITY   (Japan)

^b TOKAI UNIVERSITY   (Japan)

^c ADTEC Plasma Technology Co Ltd   (Japan)

Author keywords

C4F8 plasma; Electron energy control; Inductively coupled plasma; Mass spectral analysis; PFC abatement

Indexed keywords

DECOMPOSITION; ELECTRON ENERGY LEVELS; INDUCTIVELY COUPLED PLASMA; IONS; PRESSURE EFFECTS; REACTION KINETICS; REDUCTION; SPECTROSCOPIC ANALYSIS;

ELECTRON ENERGY CONTROL; ION PEAKS; PERFLUORINATED COMPOUND; WARMING POTENTIAL REDUCTION;

CARBON INORGANIC COMPOUNDS;

EID: 0037667791     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.42.280     Document Type: Article

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