Electron energy control in an inductively coupled plasma at low pressures

Applied Physics Letters

Volumn 76, Issue 10, 2000, Pages 1246-1248

  Shindo, Haruo ^a   Urayama, Takuya ^a   Fujii, Takashi ^a   Horiike, Yasuhiro ^b   Fujii, Syuitsu ^c  

^a TOKAI UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c ADTEC Plasma Technology Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010695332     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125998     Document Type: Article

References (10)

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