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Volumn 183, Issue 3-4, 2001, Pages 311-318

Optimized surface pretreatments for copper electroplating

Author keywords

Copper; Coulometric reduction; Electroplating; Oxide; Pretreatment; Wet cleaning

Indexed keywords

ATOMIC FORCE MICROSCOPY; COULOMETERS; ELECTROPLATING; ETCHING; REDUCTION; SPUTTER DEPOSITION; SURFACE TREATMENT;

EID: 0035965602     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00585-2     Document Type: Article
Times cited : (42)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.