|
Volumn 183, Issue 3-4, 2001, Pages 311-318
|
Optimized surface pretreatments for copper electroplating
|
Author keywords
Copper; Coulometric reduction; Electroplating; Oxide; Pretreatment; Wet cleaning
|
Indexed keywords
ATOMIC FORCE MICROSCOPY;
COULOMETERS;
ELECTROPLATING;
ETCHING;
REDUCTION;
SPUTTER DEPOSITION;
SURFACE TREATMENT;
COULOMETRIC REDUCTIONS;
COPPER;
|
EID: 0035965602
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(01)00585-2 Document Type: Article |
Times cited : (42)
|
References (27)
|