Preparation and Characterization of Low-k Silica Film Incorporated with Methylene Groups

Journal of the Electrochemical Society

Volumn 148, Issue 6, 2001, Pages

  Sugahara, Satoshi ^a,c   Kadoya, Tomohiro ^b   Usami, Koh Ichi ^a   Hattori, Takeo ^b   Matsumura, Masakiyo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKYO CITY UNIVERSITY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012363370     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1369372     Document Type: Article

References (8)

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5. J. G. Ryan, J. Hay, T. Shaw, S. Purushothaman, J. Hedrick, V. McGahay, C. Davis, D. Edelstein, and R. Goldblatt, Abstract 1352. The Electrochemical Society Meetings Abstracts, Vol. 99-2, Honolulu, HI, Oct 17-22, 1999.
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8. T. Fukumura, S. Sugahara, and M. Matsumura, Jpn. J. Appl. Phys., To be published.