Electromagnetic actuation and MOS-transistor sensing for CMOS-integrated micromechanical resonators

Sensors and Actuators, A: Physical

Volumn 103, Issue 1-2, 2003, Pages 150-155

  Lange, D ^a   Hagleitner, C ^a   Herzog, C ^a   Brand, O ^a   Baltes, H ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Electromechanic actuation; Micromechanical resonators; Transistor sensing

Indexed keywords

AMPLIFIERS (ELECTRONIC); CMOS INTEGRATED CIRCUITS; COMPOSITE MICROMECHANICS; MOS DEVICES; TRANSISTORS;

MICROMECHANICAL ACTUATORS;

RESONATORS;

EID: 0037438921     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(02)00307-2     Document Type: Conference Paper

References (22)

1. R. Berger, Ch. Gerber, H.P. Lang, J. Gimzewski, Micromechanics: a toolbox for femtoscale science: towards a laboratory on a tip, J. Microelectron. Eng. 35 (1997) 375-379.
2. J.R. Barnes, R.J. Stephenson, M.E. Welland, Ch. Gerber, J.K. Gimzewski, Photothermal spectroscopy with femtojoule sensitivity using a micromechanical device, Nature 372 (1994) 79-81.
3. T.C. Leichlé, M. vou Arx, M.G. Allen, Tech. Dig. IEEE MEMS (2001) 274-277.
4. P.I. Oden, G.Y. Chen, R.A. Steele, R.J. Warmack, T. Thundat, Viscous drag measurements utilizing microfabricated cantilevers, Appl. Phys. Lett. 68 (26) (1996) 3814-3816.
5. D. Lange, C. Hagleitner, O. Brand, H. Baltes, CMOS resonant beam gas sensing system with on-chip self-excitation, Tech. Dig. IEEE MEMS (2001) 547-552.
6. J.W. Grate, S.J. Martin, R.M. White, Acoustic-wave microsensors 1 and 2, Anal. Chem. 65 (1993) 940A-948A, 987A-996A.
7. K. Bodenhöfer, A. Hierlemann, G. Noetzel, U. Weimar, W. Göpel, Performances of mass-sensitive devices for gas sensing: thickness shear mode and surface waver acoustic wave transducers, Anal. Chem. 68 (1996) 2210-2218.
8. C. Hagleitner, A. Hierlemann, D. Lange, A. Kummer, N. Kerness, O. Brand, H. Baltes, Smart single-chip gas sensor system, Nature 414 (2001) 293-296.
9. H. Baltes, O. Paul, O. Brand, Micromachined thermally based CMOS microsensors, Proc. IEEE 86 (1998) 1660-1678.
10. S.S. Lee, R.M. White, Self-excited piezoelectric cantilever oscillators, Sens. Actuators A 52 (1996) 41-45.
11. O. Brand, H. Baltes, U. Baldeweg, Thermally excited silicon-oxide beam and bridge resonators in CMOS technology, IEEE Trans. Electron. Dev. 40 (1993) 1745-1753.
12. O. Brand, M. Hornung, H. Baltes, C. Hafner, Ultrasound barrier microsystem for object detection based on micromachined transducer elements, J. Micromech. Syst. 6 (1997) 151-160.
13. O. Brand, H. Baltes, Micromachined resonant sensors, in: H. Baltes, W. Göpel, J. Hesse (Eds.), Sensors Update, vol. 4, VCH, Weinheim, Germany, 1999.
14. Sensor apparatus and cantilever for it, European Patent 810914.2.
15. B. Shen, W. Allegretto, M. Hu, A.M. Robinson, CMOS micromachined cantilever-in-cantilever devices with magnetic actuation, IEEE Electron. Dev. Lett. 17 (2000) 372-374.
16. D.W. Lee, T. Ono, M. Esashi, Cantilever with integrated resonator for application of scanning probe microscopy, Sens. Actuators A 83 (2000) 11-16.
17. A.N. Cleland, M.L. Roukes, Fabrication of high-frequency nanometer scale mechanical resonators from bulk Si crystals, Appl. Phys. Lett. 69 (1996) 2653-2655.
18. T. Akiyama, A. Tonin, H.R. Hidber, J. Brugger, P. Vettiger, U. Staufer, N.F. de Rooij, Characterization of an integrated force sensor based on a MOS-transistor for applications in scanning force microscopy, Sens. Actuators A 64 (1998) 1-6.
19. T. Akiyama, U. Staufer, N.F. de Rooij, D. Lange, C. Hagleitner, O. Brand, H. Baltes, A. Tonin, H.R. Hidber, Integrated atomic force microscopy array probe with metal-oxide-semiconductor field effect transistor stress sensor, thermal bimorph actuator, and on-chip complementary metal-oxide-semi-conductor electronics, J. Vac. Sci. Technol. B 18 (2000) 2669-2675.
20. R.C. Jaeger, J.C. Suhling, R. Ramani, A.T Bradley, J. Xu, CMOS stress sensors on (100) silicon, IEEE J. Solid State Circuits 35 (2000) 85-95.
21. Z.Z. Wang, J. Suski, D. Collard, Piezoresistive simulation in MOSFETs, Sens. Actuators A 37-38 (1993) 357-364.
22. T. Müller, M. Brandl, O. Brand, H. Baltes, An industrial CMOS process family adapted for the fabrication of smart silicon sensors, Sens. Actuators A84 (2000) 126-133.