Industrial CMOS process family adapted for the fabrication of smart silicon sensors

Sensors and Actuators, A: Physical

Volumn 84, Issue 1, 2000, Pages 126-133

  Muller T ^a   Brandl, M ^b   Brand, O ^a   Baltes, H ^a  

^a ETH ZURICH   (Switzerland)

^b AMS AG   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ETCHING; FABRICATION; METALLIZING; MICROSCOPES; PHOTOLITHOGRAPHY; SILICON WAFERS;

ELECTROCHEMICAL ETCH STOP; SMART SILICON SENSORS;

SILICON SENSORS;

EID: 0342955717     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(99)00348-9     Document Type: Article

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