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Thin Solid Films

Volumn 386, Issue 2, 2001, Pages 261-266

Low temperature formation of microcrystalline silicon films using high-density SiH4 microwave plasma

(5) Sakuma, Yoshikazu a Liu, Haiping a Shirai, Hajime a Moriya, Yoshimizu a Ueyama, Hiroyuki b

a SAITAMA UNIVERSITY (Japan)

b Nihon Koshuha Co Ltd (Japan)

Author keywords

c Si:H; High density plasma; Microwave plasma; Optical emission spectroscopy (OES); SiH4; Spokewise antenna

Indexed keywords

CARRIER CONCENTRATION; CRYSTALLINE MATERIALS; DEPOSITION; EMISSION SPECTROSCOPY; FILM GROWTH; MICROWAVE ANTENNAS; OPTICAL CORRELATION; PHOTOCONDUCTIVITY; PLASMAS; SEMICONDUCTING SILICON; SUBSTRATES; THIN FILMS;

MICROCRYSTALLINE SILICON FILMS; MICROWAVE PLASMAS; OPTICAL EMISSION SPECTROSCOPY (OES); SPOKEWISE ANTENNA;

SEMICONDUCTING FILMS;

EID: 0035874155 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(00)01678-3 Document Type: Article

Times cited : (15)

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