Microwave plasma oxidation of gallium nitride

Thin Solid Films

Volumn 425, Issue 1-2, 2003, Pages 20-23

  Pal, S ^a   Mahapatra, R ^a   Ray, S K ^a   Chakraborty, B R ^b   Shivaprasad, S M ^b   Lahiri, S K ^a   Bose, D N ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Nitrides; Oxidation; Plasma processing and deposition; Secondary ion mass spectrometry; X ray photoelectron spectroscopy

Indexed keywords

GALLIUM NITRIDE; LOW TEMPERATURE EFFECTS; OXIDATION; PLASMA THEORY; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

MICROWAVE PLASMA OXIDATION;

MICROWAVES;

EID: 0037415946     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01055-6     Document Type: Article

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