Low interface trap density for remote plasma deposited SiO2 on n-type GaN

Applied Physics Letters

Volumn 68, Issue 13, 1996, Pages 1850-1852

  Casey Jr , H C ^a   Fountain, G G ^b   Alley, R G ^b   Keller, B P ^c   Denbaars, Steven P ^c  

^a Duke University   (United States)

^b RTI INTERNATIONAL   (United States)

^c University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000266350     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116034     Document Type: Article

References (19)

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