Effects of carbon additions on crystallinity and resistivity in Si-C-H thin films deposited by CVDs

Journal of Physics and Chemistry of Solids

Volumn 64, Issue 5, 2003, Pages 777-784

  Du, Piyi ^a   Song, Chenlu ^a   Weng, Wenjian ^a   Han, Gaorong ^a   Shen, Ge ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

A. Thin films; B. Crystal growth; B. Vapor deposition; D. Electrical conductivity

Indexed keywords

ADDITION REACTIONS; CARBON; CRYSTAL GROWTH; ELECTRIC CONDUCTIVITY; INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROBABILITY; PYROLYSIS; TRANSMISSION ELECTRON MICROSCOPY;

FILM DEPOSITION;

THIN FILMS;

EID: 0037408423     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3697(02)00373-6     Document Type: Article

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