Mechanical properties of nanometric structures of Si/SiC, C/SiC and C/SiN produced by PECVD

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 1115-1120

  Bertran, E ^a   Martinez E ^a   Viera, G ^a   Farjas, J ^b   Roura, P ^b  

^a UNIVERSITY OF BARCELONA   (Spain)

^b UNIVERSITY OF GIRONA   (Spain)

Author keywords

a C; a SiN; Amorphous multilayers; Nanostructured materials; ns Si; ns SiC; Plasma enhanced chemical vapor deposition(PECVD)

Indexed keywords

DEPOSITION; GLASS FIBER; MATERIALS; MECHANICAL PROPERTY; NANOMETRIC STRUCTURE; ROOM TEMPERATURE; SILICON CARBIDE;

ANNEALING; CRACKS; CRYSTALLIZATION; DEHYDROGENATION; DEPOSITION; ELASTIC MODULI; INDENTATION; ION BOMBARDMENT; LENSES; MAGNETIC DEVICES; MORPHOLOGY; MULTILAYERS; OPTICAL FIBERS; PROTECTIVE COATINGS; SILICON;

POST-THERMAL TREATMENTS;

NANOSTRUCTURED MATERIALS;

CARBON; INORGANIC COATING; MECHANICAL PROPERTY; SILICON; SILICON CARBIDE; SILICON NITRIDE; WEAR;

EID: 0035270735     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00430-1     Document Type: Article

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