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Volumn 557, Issue , 1999, Pages 603-608

High quality microcrystalline silicon-carbide films prepared by photo-CVD method using ethylene gas as a carbon source

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; ETHYLENE; FILM PREPARATION; HYDROGEN; OPTICAL PROPERTIES; RAMAN SPECTROSCOPY; SILANES; THIN FILMS;

EID: 0033297455     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-603     Document Type: Article
Times cited : (12)

References (18)
  • 3
    • 0000899218 scopus 로고    scopus 로고
    • Appl. Phys. Lett. 71, 1846 (1997).
    • (1997) Appl. Phys. Lett. , vol.71 , pp. 1846
  • 6
    • 0006346888 scopus 로고    scopus 로고
    • J. Appl. Phys. 81(5), 2432 (1997).
    • (1997) J. Appl. Phys. , vol.81 , Issue.5 , pp. 2432


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.