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Volumn 557, Issue , 1999, Pages 603-608
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High quality microcrystalline silicon-carbide films prepared by photo-CVD method using ethylene gas as a carbon source
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Author keywords
[No Author keywords available]
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Indexed keywords
CARBON;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL MICROSTRUCTURE;
CRYSTALLINE MATERIALS;
ELECTRIC CONDUCTIVITY;
ETHYLENE;
FILM PREPARATION;
HYDROGEN;
OPTICAL PROPERTIES;
RAMAN SPECTROSCOPY;
SILANES;
THIN FILMS;
DIBORANE;
MICROCRYSTALLINE;
PHOTOCHEMICAL VAPOR DEPOSITION;
SILICON CARBIDE;
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EID: 0033297455
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-557-603 Document Type: Article |
Times cited : (12)
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References (18)
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