Titanium nitride prepared by plasma-based titanium-ion implantation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 2, 1999, Pages 840-844

  Yukimura, Ken ^a  

^a DOSHISHA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644452112     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590648     Document Type: Article

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