Effects of plasma treatment on SiO2 aerogel film using various reactive (O2, H2, N2) and non-reactive (He, Ar) gases

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 525-529

  Kim, Jean Jong ^a   Park, Hyung Ho ^a   Hyun, Sang Hoon ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AEROGELS; ARGON; ELECTRIC RESISTANCE; HELIUM; HYDROGEN; LEAKAGE CURRENTS; NITROGEN; OXYGEN; PERMITTIVITY; PLASMA APPLICATIONS; SILICA GEL; ULSI CIRCUITS;

HYDROXYL GROUPS;

SEMICONDUCTING FILMS;

EID: 18844477056     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01295-5     Document Type: Article

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