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Volumn 423, Issue 1, 2003, Pages 97-102

Annealing effects on structural and electrical properties of fluorinated amorphous carbon films deposited by plasma enhanced chemical vapor deposition

(3) Yi, Jeong W a Lee, Young H a Farouk, Bakhtier a

a Drexel University (United States)

Author keywords

Dielectric constant; Fluorinated amorphous carbon films; Thermal stability

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CROSSLINKING; ELECTRIC CHARGE; ELECTRIC PROPERTIES; FLUORINE; GRAPHITIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMODYNAMIC STABILITY;

TIME DELAY;

THIN FILMS;

EID: 0037217672 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00614-4 Document Type: Article

Times cited : (18)

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