SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 67, Issue 3-4, 2002, Pages 531-536

Rapid thermal annealing effects on plasma deposited SiOx:H films

(7) San Andres E a Del Prado, A a Martil I a Gonzalez Diaz G a Martinez, F L b Bravo, D c Lopez F J c

a UNIVERSIDAD COMPLUTENSE DE MADRID (Spain)

b TECHNICAL UNIVERSITY OF CARTAGENA (Spain)

c UNIVERSIDAD AUTÓNOMA DE MADRID (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL BONDS; COMPOSITION; HIGH TEMPERATURE EFFECTS; INFRARED SPECTROSCOPY; PARAMAGNETIC RESONANCE; RAPID THERMAL ANNEALING; SILICA;

INFRARED ABSORPTION MEASUREMENTS;

SEMICONDUCTING FILMS;

EID: 0037179769 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/S0042-207X(02)00244-0 Document Type: Conference Paper

Times cited : (10)

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