Observation of Si cluster formation in SiO2 films through annealing process using x-ray photoelectron spectroscopy and infrared techniques

Applied Physics Letters

Volumn 72, Issue 6, 1998, Pages 725-727

  Furukawa, Katsuhiko ^a   Liu, Yichun ^a   Nakashima, Hiroshi ^a   Gao, Dawei ^a   Uchino, Kiichiro ^a   Muraoka, Katsunori ^a   Tsuzuki, Hirohisa ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000592739     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120865     Document Type: Article

References (9)

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