Physical properties of plasma deposited SiOx thin films

Vacuum

Volumn 67, Issue 3-4, 2002, Pages 525-529

  San Andres E ^a   Del Prado, A ^a   Martil I ^a   Gonzalez G ^a   Martinez F L ^b   Bravo, D ^c   Lopez F J ^c   Fernandez M ^d  

^a UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^b TECHNICAL UNIVERSITY OF CARTAGENA   (Spain)

^c UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^d INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COMPOSITION; ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; INFRARED SPECTROSCOPY; PARAMAGNETIC RESONANCE; PHYSICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILANES; SILICA;

PARAMAGNETIC DEFECTS;

THIN FILMS;

EID: 0037179723     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00243-9     Document Type: Conference Paper

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