Lewis acid mediated hydrosilylation on porous silicon surfaces

Journal of the American Chemical Society

Volumn 121, Issue 49, 1999, Pages 11491-11502

  Buriak, Julian M ^a   Stewart, Michael P ^a   Geders, Todd W ^a   Allen, Matthew J ^a   Choi, Hee Cheul ^a   Smith, Jay ^a   Raftery, Daniel ^a   Canham, Leigh T ^b  

^a PURDUE UNIVERSITY   (United States)

^b DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACID; ALKENE; ALKYNE; SILICON;

ARTICLE; CHEMICAL REACTION; HYDROLYSIS; HYDROPHOBICITY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OXIDATION; POROSITY; STEREOCHEMISTRY;

EID: 0033573088     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja992188w     Document Type: Article

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