Thermal stability of the exchanged biased CoFe/IrMn electrode for the magnetic tunnel junction as a function of CoFe thickness

Journal of Applied Physics

Volumn 92, Issue 10, 2002, Pages 6241-6244

  Lee, J H ^a   Kim, S J ^a   Yoon, C S ^a   Kim, C K ^a   Park, B G ^b   Lee, T D ^b  

^a Hanyang University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC TUNNEL JUNCTION; TUNNEL BARRIER; TUNNELING MAGNETORESISTANCE;

AUGER ELECTRON SPECTROSCOPY; DEGRADATION; DIFFUSION BARRIERS; IRIDIUM COMPOUNDS; MANGANESE; TRANSMISSION ELECTRON MICROSCOPY;

MAGNETIC DEVICES;

EID: 0037112981     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1516623     Document Type: Article

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