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Applied Physics Letters

Volumn 80, Issue 21, 2002, Pages 3976-3978

Diffusion study of the exchange-biased NiFe/MnIr/CoFe electrode in magnetic tunnel junctions

(6) Yoon, C S a Lee, J H a Jeong, H D a Kim, C K a Yuh, J H b Haasch, Rick b

a Hanyang University (South Korea)

b United States of America (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION STUDIES; INSULATOR LAYER; MAGNETIC TUNNEL JUNCTION; MAGNETIC TUNNELING JUNCTIONS; MN OXIDES; OXIDATION TIME; PREFERENTIAL OXIDATION; XPS DATA;

AUGER ELECTRON SPECTROSCOPY; DIFFUSION; MANGANESE; X RAY PHOTOELECTRON SPECTROSCOPY;

TUNNEL JUNCTIONS;

EID: 79956004090 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1481185 Document Type: Article

Times cited : (20)

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