Study of argon characteristics in ion physical vapor deposition using molecular dynamics simulation

Journal of Applied Physics

Volumn 91, Issue 6, 2002, Pages 3569-3578

  Hwang, Chi Chuan ^a   Huang, Gwo Jiunn ^b   Chang, Jee Gong ^a   Ju, Shin Pon ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b SWANSEA UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION MODELS; INTERATOMIC FORCES; MAGNETRON DEPOSITION; MANY-BODY; MOLECULAR DYNAMICS SIMULATIONS; MOLIERE POTENTIAL; NEUTRAL ATOMS; TIGHT BINDING POTENTIAL; TRENCH FILLINGS;

ATOMS; FILLING; MOLECULAR DYNAMICS; MOLECULAR MECHANICS; MORPHOLOGY; VAPORS;

IONS;

EID: 0037087330     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1450032     Document Type: Article

References (28)

1. S. M. Rossnagel and J. Hopwood, J. Vac. Sci. Technol. B 12, 449 (1994).
2. S. Hamaguchi and S. M. Rossnagel, J. Vac. Sci. Technol. B 14, 2603 (1996).
3. C. A. Nichols, S. M. Rossnagel, and S. Hamaguchi, J. Vac. Sci. Technol. B 14, 3270 (1996).
4. S. M. Rossnagel, J. Vac. Sci. Technol. B 16, 3008 (1998).
5. P. F. Cheng and S. M. Rossnagel, J. Vac. Sci. Technol. B 13, 203 (1995).
6. S. M. Rossnagel, J. Vac. Sci. Technol. B 16, 2585 (1998).
7. S. M. Rossnagel and J. Hopwood, Appl. Phys. Lett. 63, 3285 (1993).
8. S. Hamaguchi and S. M. Rossnagel, J. Vac. Sci. Technol. B 13, 183 (1995).
9. M. A. Vyvoda, C. F. Abrams, and D. B. Grave, IEEE Trans. Plasma Sci. 5, 1433 (1999).
10. R. Biswas and D. R. Hamann, Phys. Rev. B 34, 895 (1986).
11. H. J. C. Berendsen, J. P. M. Postma, W. F. van Gunsteren, A. DiNola, and J. R. Haak, J. Chem. Phys. 81, 3684 (1984).
12. C. Kim, H. Kang, and Seung C. Park, Nucl. Instrum. Methods Phys. Res. B 95, 171 (1995).
13. Z. Insepov and I. Yamada, Mater. Sci. Eng., A 217, 89 (1996).
14. X. W. Zhou, R. A. Johnson, and H. N. G. Wadley, Acta Mater. 45, 1513 (1997).
15. A. A. R. Elshabini and F. D. Barlow III, Thin Film Technology Handbook (McGraw-Hill, New York, 1998).
16. G. A. Kimmel and B. H. Cooper, Phys. Rev. B 48, 12164 (1993).
17. D. E. Hanson, A. F. Voter, and J. D. Kress, J. Appl. Phys. 82, 3552 (1997).
18. D. G. Coronell, D. E. Hansen, A. F. Voter, C. L. Liu, X. Y. Liu, and J. D. Kress, Appl. Phys. Lett. 73, 3860 (1998).
19. J. D. Kress, D. E. Hanson, A. F. Voter, C. L. Liu, X. Y. Liu, and D. G. Coronell, J. Vac. Sci. Technol. A 17, 2819 (1999).
20. F. Cleri and V. Rosato, Phys. Rev. B 48, 22 (1993).
21. V. Rosato, M. Guillope, and B. Legrand, Philos. Mag. A 59, 321 (1989).
22. F. Cleri and V. Rosato, Phys. Rev. B 48, 22 (1993).
23. M. Ladeveze, G. Treglia, P. Muller, and F. Arnaud d'Avitaty, Surf. Sci. 395, 317 (1998).
24. T. Iwasaki, Computational Mech., Berlin 25, 78 (2000).
25. K. H. Muller, Phys. Rev. B 35, 7690 (1987).
26. B. Strickland and C. Roland, Phys. Rev. B 51, 5061 (1995).
27. J. M. Haile, Molecular Dynamic Simulation (Wiley, New York, 1992).
28. T. S. Cale, T. P. Merchant, L. J. Borucki, and A. H. Labun, Thin Solid Films 365, 152 (2000).