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Volumn 395, Issue 2-3, 1998, Pages 317-325

Step-driven molecular adsorption of Sb on Si (111)

(4) Ladeveze M a Treglia G a Muller P a D'Avitaya, F Arnaud a

Author keywords

Anitomy; Auger electron spectroscopy; Chemisorption; Molecular beam epitaxy; Molecular dynamics; Semi empirical models and model calculations; Silicon; Single crystal surfaces; Surface structure, morphology, roughness, and topography; Thermal desorption spect

Indexed keywords

ADSORPTION; ANTIMONY; AUGER ELECTRON SPECTROSCOPY; CHEMISORPTION; DESORPTION; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; MOLECULAR DYNAMICS; MORPHOLOGY; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SURFACE ROUGHNESS;

STEP DRIVEN MOLECULAR ADSORPTION; THERMAL DESORPTION SPECTROSCOPY;

SEMICONDUCTOR DOPING;

EID: 0031682010 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(97)00635-3 Document Type: Article

Times cited : (19)

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