Poly(t-butyl-3α-(5-norbornene-2-carbonyloxy)-7α,12α-dihydroxy-5β-chol an-24-oate-co-maleic anhydride) for a 193-nm photoresist

Polymer

Volumn 40, Issue 26, 1999, Pages 7423-7426

  Kim, Jin Baek ^a   Lee, Bum Wook ^a   Kang, Jae Sung ^a   Seo, Dong Chul ^b   Roh, Chi Hyung ^c  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Kumho Petrochemical Co Ltd   (South Korea)

^c Hynix Semiconductor Inc   (South Korea)

Author keywords

193 nm photoresist; Dry etching resistance; Norbornene

Indexed keywords

DRY ETCHING; EXCIMER LASERS; LIGHT TRANSMISSION; PHOTORESISTS; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY;

MALEIC ANHYDRIDE;

COPOLYMERS;

ALICYCLIC COMPOUND; MALEIC ANHYDRIDE; NORBORNENE DERIVATIVE; POLYMER;

ARTICLE; CHEMICAL MODIFICATION; PHYSICAL CHEMISTRY; PRINTING; SYNTHESIS; THERMOSTABILITY;

EID: 0344603841     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(99)00388-2     Document Type: Article

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