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Volumn 516, Issue 1-2, 2002, Pages 43-55

Ar+-induced surface defects on HOPG and their effect on the nucleation, coalescence and growth of evaporated copper

a ÉCOLE POLYTECHNIQUE DE MONTRÉAL (Canada)

Author keywords

Clusters; Copper; Growth; Ion bombardment; Nucleation; Surface defects; Surface diffusion; X ray photoelectron spectroscopy

Indexed keywords

CHEMICAL BONDS; COALESCENCE; COPPER; CRYSTAL DEFECTS; CRYSTAL GROWTH; DEPOSITION; DIFFUSION IN SOLIDS; ELECTROSTATICS; ION BOMBARDMENT; NUCLEATION; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE DEFECTS;

SURFACE TOPOGRAPHY;

EID: 0037056257 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(02)02065-4 Document Type: Article

Times cited : (63)

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