Probing carboxylic acid groups in replaced and mixed self-assembled monolayers by individual ionized dendrimer molecules: An atomic force microscopy study

Langmuir

Volumn 18, Issue 5, 2002, Pages 1801-1810

  Zhang, Hua ^a   Grim, P C M ^a   Liu, Daojun ^a   Vosch, T ^a   De Feyter, S ^a   Wiesler, U M ^b   Berresheim, A J ^b   Mullen K ^b   Van Haesendonck, C ^a   Vandamme, N ^a   De Schryver, Frans C ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; DENDRIMERS; GOLD; IONIZATION; SELF ASSEMBLY;

NONCONTACT ATOMIC FORCE MICROSCOPY (NCAFM);

CARBOXYLIC ACIDS;

EID: 0037023043     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la011061t     Document Type: Article

References (86)

1. (a) Newkome, G.R.; Moorefield, C.N.; Vögtle, F. Dendritic Molecules: Concepts, Synthesis, Perspectives; VCH: Weinheim, 1996.
2. (b) Zeng, F.; Zimmerman, S.C. Chem. Rev. 1997, 97, 1681.
3. (c) Fréchet, J.M.J. Science 1994, 263, 1710.
4. (d) Berresheim, A.J.; Müller, M.; Müllen, K. Chem. Rev. 1999, 99, 1747.
5. (a) Reetz, M.T.; Lohmer, G.; Schwickardi, R. Angew. Chem., Int. Ed. 1997, 36, 1526.
6. (b) Bhyrappa, P.; Young, J.K.; Moore, J.S.; Suslick, K.S. J. Am. Chem. Soc. 1996, 118, 5708.
7. (c) Chow, H.-F.; Mak, C.C. J. Org. Chem. 1997, 62, 5116.
8. (a) Jockusch, S.; Ramirez, J.; Sanghvi, K.; Nociti, R.; Turro, N. J.; Tomalia, D.A. Macromolecules 1999, 32, 4419.
9. (b) Gilat, S.L.; Adronov, A.; Fréchet, J.M.J. Angew. Chem., Int. Ed. Engl. 1999, 38, 1422.
10. (c) Hofkens, J.; Latterini, L.; De Belder, G.; Gensch, T.; Maus, M.; Vosch, T.; Karni, Y.; Schweitzer, G.; De Schryver, F.C.; Hermann, A.; Müllen, K. Chem. Phys. Lett. 1999, 304, 1.
11. (d) Devadoss, C.; Bharati, P.; Moore, J.S. J. Am. Chem. Soc. 1996, 118, 9635.
12. (e) Balzani, V.; Campagna, S.; Denti, G.; Juris, A.; Serroni, S.; Venturi; M. Acc. Chem. Res. 1998, 31, 26.
13. (a) Halim, M.; Pillow, J.N.G.; Samuel, I.D.W.; Burn, P.L. Adv. Mater. 1999, 11, 371.
14. (b) Kraft, A. J. Chem. Soc., Chem. Commun. 1996, 77.
15. (c) Wang, P.W.; Liu, Y.J.; Devadoss, C.; Bharathi, P.; Moore, J.S. Adv. Mater. 1996, 8, 237.
16. (d) Shirota, Y.; Kuwabara, Y.; Inada, H.; Wakimoto, T.; Nakada, H.; Yonemoto, Y.; Kawami, S.; Imai, K. Appl. Phys. Lett. 1994, 65, 807.
17. Kovvali, A.S.; Chen, H.; Sirkar, K.K. J. Am. Chem. Soc. 2000, 122, 7594.
18. Kukowska-Latallo, J.F.; Bielinska, A.U.; Johnson, J.; Spindler, R.; Tomalia, D.A.; Baker, J.R. Proc. Natl. Acad. Sci. U.S.A. 1996, 93, 4897.
19. (a) Zhao, M.; Sun, L.; Crooks, R.M. J. Am. Chem. Soc. 1998, 120, 4877.
20. (b) Balogh, L.; Tomalia, D.A. J. Am. Chem. Soc. 1998, 120, 7355.
21. Zhao, M.; Crooks, R.M. Angew. Chem., Int. Ed. Engl. 1999, 38, 364.
22. (a) Wells, M.; Crooks, R.M. J. Am. Chem. Soc. 1996, 118, 3988.
23. (b) Bliznyuk, V.N.; Rinderspacher, F.; Tsukruk, V.V. Polymer 1998, 39, 5249.
24. (c) Tsukruk, V.V.; Rinderspacher, F.; Bliznyuk, V.N. Langmuir 1997, 13, 2171.
25. (a) Rubin, S.; Bar, G.; Taylor, T.N.; Cutts, R.W.; Zawodzinski, T.A., Jr. J. Vac. Sci. Technol. 1996, 14, 1870.
26. (b) Bar, G.; Rubin, S.; Cutts, R.W.; Taylor, T.N.; Zawodzinski, T.A., Jr. Langmuir 1996, 12, 1172.
27. (a) Tully, D.C.; Wilder, K.; Fréchet, J.M.J.; Trimble, A.R.; Quate, C.F. Adv. Mater. 1999, 11, 314.
28. (b) Tully, D.C.; Trimble, A.R.; Fréchet, J.M.J.; Wilder, K.; Quate, C.F. Chem. Mater. 1999, 11, 2892.
29. (a) Sheiko, S.S.; Eckert, G.; Ignat'Eva, G.; Muzafarov, A.M.; Spickermann, J.; Räder, H.J.; Möller, M. Macromol. Rapid Commun. 1996, 17, 283.
30. (b) Huck, W.T.S.; van Veggel, F.C.J.M.; Sheiko, S.S.; Möller, M.; Reinhoudt, D.N. J. Phys. Org. Chem. 1998, 11, 540.
31. (c) Hellmann, J.; Hamano, M.; Karthaus, O.; Ijiro, K.; Shimomura, M.; Irie, M. Jpn. J. Appl. Phys. 1998, 37, L816.
32. Ponomarenko, S.A.; Boiko, N.I.; Shibaev, V.P.; Magonov, S.N. Langmuir 2000, 16, 5487.
33. Loi, S.; Wiesler, U.-M.; Butt, H.-J.; Müllen, K. Chem. Commun. 2000, 1169.
34. (a) Li, J.; Piehler, L.T.; Qin, D.; Baker, J.R.; Tomalia, D.A.; Meier, D.J. Langmuir 2000, 16, 5613.
35. (b) Li, J.; Swanson, D.R.; Qin, D.; Brothers, H.M.; Piehler, L.T.; Tomalia, D.; Meier, D.J. Langmuir 1999, 15, 7347.
36. (c) Hierlemann, A.; Campbell, J.K.; Baker, L.A.; Crooks, R.M.; Ricco, A.J. J. Am. Chem. Soc. 1998, 120, 5323.
37. (a) Binnig, G.; Quate, C.F.; Gerber, Ch. Phys. Rev. Lett. 1986, 56, 930.
38. (b) Takano, H.; Kenseth, J.R.; Wong, S.-S.; O'Brien, J.C.; Porter, M.D. Chem. Rev. 1999, 99, 2845.
39. Stocker, W.; Karakaya, B.; Schürmann, B.L.; Rabe, J.P.; Schlüter, A.D. J. Am. Chem. Soc. 1998, 120, 7691.
40. (a) Tokuhisa, H.; Zhao, M.; Baker, L.A.; Phan, V.T.; Dermody, D.L.; Garcia, M.E.; Peez, R.F.; Crooks, R.M.; Mayer, T.M. J. Am. Chem. Soc. 1998, 120, 4492.
41. (b) Lackowski, W.M.; Campbell, J.K.; Edwards, G.; Chechik, V.; Crooks, R.M. Langmuir 1999, 15, 7632.
42. Chechik, V.; Crooks, R.M. Langmuir 1999, 15, 6364.
43. (a) Friggeri, A.; Schönherr, H.; van Manen, H.-J.; Huisman, B.-H.; Vancso, G.J.; Huskens, J.; van Veggel, F.C.J.M.; Reinhoudt, D.N. Langmuir 2000, 16, 7757.
44. (b) Huisman, B.-H.; Schönherr, H.; Huck, W.T.S.; Friggeri, A.; van Manen, H.-J.; Menozzi, E.; Vancso, G.J.; van Veggel, F.C.J.M.; Reinhoudt, D.N. Angew. Chem., Int. Ed. Engl. 1999, 38, 2248.
45. (a) Ulman, A. Chem. Rev. 1996, 96, 1533.
46. (b) Ulman, A. An Introduction to Ultrathin Organic Films; Academic Press: Boston, 1991.
47. Wadu-Mesthrige, K.; Amro, N.;Xu, S.; Liu, G.-Y. Langmuir 1999, 15, 8580.
48. (a) Shipway, A.N.; Katz, E.; Willner, I. ChemPhysChem 2000, 1, 18.
49. (b) He, H.X.; Zhang, H.; Li, Q.G.; Zhu, T.; Li, S.F.Y.; Liu, Z. F. Langmuir 2000, 16, 3846.
50. Vaeth, K.M.; Jackman, R.J.; Black, A.J.; Whitesides, G.M.; Jensen, K.F. Langmuir 2000, 16, 8495.
51. (a) Xia, Y.; Whitesides, G.M. Annu. Rev. Mater. Sci. 1998, 28, 153.
52. (b) He, H.X.; Huang, W.; Zhang, H.; Li, Q.G.; Li, S.F.Y.; Liu, Z. F. Langmuir 2000, 16, 517.
53. (c) He, H.X.; Li, Q.G.; Zhou, Z.Y.; Zhang, H.; Li, S.F.Y.; Liu, Z.F. Langmuir 2000, 16, 9683.
54. (a) Liu, G.-Y.; Xu, S.; Qian, Y. Acc. Chem. Res. 2000, 33, 457.
55. (b) Sugimura, H.; Ushiyama, K.; Hozumi, A.; Takai, O. Langmuir 2000, 16, 885.
56. (c) Zheng J.W.; Zhu, Z.H.; Chen, H.F.; Liu, Z.F. Langmuir 2000, 16, 4409.
57. (d) Sugimura, H.; Nakagiri, N. J. Am. Chem. Soc. 1997, 119, 9226.
58. (a) Tamada, K.; Hara, M.; Sasabe, K.; Knoll, W. Langmuir 1997, 13, 1558.
59. (b) Hayes W.A.; Kim H.; Yue X.; Perry S.S.; Shannon C., Langmuir 1997, 13, 2511.
60. (c) Shon, Y.-S.; Lee, S.; Perry, S.S.; Lee, T. R. J. Am. Chem. Soc. 2000, 122, 1278.
61. (d) Imabayashi, S.-i.; Gon, N.; Sasaki, T.; Hobara, D.; Kakiuchi, T. Langmuir 1998, 14, 2348.
62. (a) Kakiuchi, T.; Sato, K.; Iida, M.; Hobara, D.; Imabayashi, S.-i.; Niki, K. Langmuir 2000, 16, 7238.
63. (b) Cooper, E.; Leggett, G.J. Langmuir 1999, 15, 1024.
64. (c) Dishner, M.H.; Taborek, P.; Hemminger, J.C.; Feher, F.J. Langmuir 1998, 14, 6676.
65. (a) Lin, P.-H.; Guyot-Sionnest, P. Langmuir 1999, 15, 6825.
66. (b) Ishida, T.; Mizutani, W.; Tokumoto, H.; Choi, N.; Akiba, U.; Fujihira, M. J. Vac. Sci. Technol., A 2000, 18, 1437.
67. (c) Bumm, L.A.; Arnold, J. J.; Cygan, M.T.; Dunbar, T.D.; Burgin, T.P.; Jones, L.; Allara, D.L.; Tour, J.M.; Weiss, P.S. Science 1996, 271, 1705.
68. (a) Folkers, J.P.; Laibinis, P.E.; Whitesides, G.M. Langmuir 1992, 8, 1330.
69. (b) Bain, C.D.; Evall, J.; Whitesides, G.M. J. Am. Chem. Soc. 1989, 111, 7155.
70. (c) Bain, C.D.; Whitesides, G.M. J. Am. Chem. Soc. 1989, 111, 7164.
71. Stranick, S.J.; Parikh, A.N.; Tao, Y.-T.; Allara, D.L.; Weiss, P.S. J. Phys. Chem. 1994, 98, 7636.
72. (a) Zhang, H.; Grim, P.C.M.; Foubert, P.; Vosch, T.; Vanoppen, P.; Wiesler, U.-M.; Berresheim, A.J.; Müllen, K.; De Schryver, F.C. Langmuir 2000, 16, 9009.
73. (b) Zhang, H.; Grim, P.C.M.; Vosch, T.; Wiesler, U.-M.; Berresheim, A.J.; Müllen, K.; De Schryver, F.C. Langmuir 2000, 16, 9294.
74. Rosa-Zeiser, A.; Weilandt, E.; Weilandt, H.; Marti, O. Meas. Sci. Technol. 1997, 8, 1333.
75. (a) Zhang, H.; He, H.X.; Wang, J.; Liu, Z.F. Langmuir 2000, 16, 4554.
76. (b) Zhang, H.; He, H.X.; Mu, T.; Liu, Z.F. Thin Solid Films 1998, 329, 778.
77. (c) Zhang, H.; Zhang, H.L.; He, H.X.; Zhu, T.; Liu, Z. F. Mater. Sci. Eng., C 1999, 8-9, 191.
78. (d) Zhang, H.; He, H.X.; Wang, J.; Mu, T.; Liu, Z.F. Appl. Phys. A 1998, 66, S269.
79. Vandamme, N.; Verschoren, G.; Depuydt, A.; Cannaerts, M.; Bouwen, W.; Lievens, P.; Silverans, R.E.; Van Haesendonck, C. Appl. Phys. A 2001, 72, S177.
80. (a) Zhang, H.; Fu, D.G.; Ji, F.; Wang, G.X.; Yu, K.B.; Yao, T.Y. J. Chem. Soc., Dalton Trans. 1996, 3799.
81. (b) Smith, D.R. Coord. Chem. Rev. 1998, 172, 457.
82. Halgren, T.A. J. Comput. Chem. 1996, 17, 490.
83. Koutsos, V.; van der Vegte, E.W.; Pelletier, E.; Stamouli, A.; Hadziioannou, G. Macromolecules 1997, 30, 4719.
84. (a) Yang, J.; Laurion, T.; Jao, T.-C.; Fendler, J.H. J. Phys. Chem. 1994, 98, 9391.
85. (b) Markiewicz, P.; Goh, M.C. Langmuir 1994, 10, 5.
86. - group terminated SAM.