Nucleation and growth of Cu films during the initial stage of chemical vapor deposition

Journal of Applied Physics

Volumn 90, Issue 7, 2001, Pages 3610-3613

  Chae, Y K ^a   Komiyama, H ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035477532     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1385359     Document Type: Article

References (9)

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