A novel Cu(II) chemical vapor deposition precursor: Synthesis, characterization, and chemical vapor deposition

Journal of Materials Research

Volumn 13, Issue 3, 1998, Pages 687-692

  Devi, Anjana ^a   Goswami, J ^a   Lakshmi, R ^a   Shivashankar, S A ^a   Chandrasekaran, S ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHEMICAL MODIFICATION; COPPER; DECOMPOSITION; DIFFERENTIAL THERMAL ANALYSIS; INFRARED SPECTROSCOPY; MASS SPECTROMETRY; PYROLYSIS; SUBLIMATION; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION;

ELEMENTAL ANALYSIS; LIGAND TBAOAC; MELTING POINT DETERMINATION; SUBLIMATION RATE;

CHEMICAL VAPOR DEPOSITION;

EID: 0032025410     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1998.0086     Document Type: Article

References (35)

1. Chemical Vapor Deposition: Principles and Applications, edited by M. L. Hitchman and K. F. Jensen (Academic Press, New York, 1993).
2. Handbook of Chemical Vapor Deposition, edited by H. O. Pierson (Noyes Publications, Park Ridge, NJ, 1992).
3. G. B. Stringfellow, Organometallic Vapor Phase Epitaxy: Theory and Practice (Academic Press, San Diego, CA, 1989).
4. The Chemistry of Metal CVD, edited by T. Kodas and Mark J. Hampden-Smith (VCH Publishers Inc., Weinheim, Germany, 1994).
5. Thin Film Processes II, edited by J. L. Vossen and W. Kern (Academic Press, Inc., Boston, 1991).
6. S. Oda, H. Zama, and S. Yamamoto, J. Cryst. Growth 145, 232 (1994).
7. C. H. Warren, B. D. Seshu, and H. P. Cheng, Chem. Mater. 6, 1955 (1994).
8. H. S. Park, M. Mokhtari, and H. W. Roesky, Chem. Vap. Dep. 2, 135 (1996).
9. L. H. Dubois and B. R. Zegarski, J. Electrochem. Soc. 139, 3295 (1992).
10. N. Awaya and Y. Arita, Jpn. J. Appl. Phys. 32, 3915 (1993).
11. H. P. Chen and B. D. Seshu, J. Am. Ceram. Soc. 77, 1799 (1994).
12. T. Kimura, H. Yamauchi, H. Machida, H. Kokubun, and M. Yamada, Jpn. J. Appl. Phys. 33, 5119 (1994).
13. K-H. Dahmen and T. Gerfin, Prog. Cryst. Growth and Charact. 27, 117 (1993).
14. V. A. C. Hannapel, H. D. van Corbach, T. Fransen, and P. J. Gellings, Thin Solid Films 230, 138 (1993).
15. H-K. Shin, K-M. Chi, M. J. Hampden-Smith, T. T. Kodas, J. D. Farr, and M. Paffett, Adv. Mater. 3, 246 (1991).
16. A. E. Kaloyeros and A. F. Michael, MRS Bull. 18, 22 (1993).
17. S. P. Murarka and S. W. Hymes, CRC Crit. Rev. Solid State Mater. Sci. 20, 87 (1995).
18. T. Ohmi and K. Tsubouchi, Solid State Technol. 35, 47 (1992).
19. D. Kim, R. H. Wentorf, and W. N. Gill, J. Electrochem. Soc. 140, 3273 (1993).
20. J. M. E. Harper, E. G. Colgan, C-K. Hu, J. P. Hummel, L. P. Buchwalter, and C. E. Uzoh, MRS Bull. Aug., 23 (1994).
21. The Chemistry of Metal CVD, edited by T. T. Kodas and M. J. Hampden-Smith (VCH Publishers Inc., Weinheim, Germany, 1994), Chap. 4, p. 175.
22. Y. Pauleau and A. Y. Fasasi, Chem. Mater. 3, 45 (1991).
23. D. Temple and A. Reisman, J. Electrochem. Soc. 136, 3525 (1989).
24. M. J. Hampden-Smith and T. T. Kodas, Polyhedron 14, 699 (1995).
25. S. K. Reynolds, C. J. Smart, and E. F. Baran, Appl. Phys. Lett. 59, 2332 (1991).
26. T. H. Stumm and H. van den Bergh, Mater. Sci. Eng. B23, 48 (1994).
27. J. Goswami, Ph.D. Thesis, Indian Institute of Science, Bangalore (1995).
28. S. Patnaik, T. N. Guru Row, R. Lakshmi, Anjana Devi, J. Goswami, S.A. Shivashankar, S. Chandrasekaran, and W. T. Robinson, Acta Crystallogr. C52, 891 (1996).
29. K. J. Eisentraut and R. E. Sievers, J. Inorg. Nucl. Chem. 29, 1931 (1967).
30. S. P. Murarka, R. J. Gutmann, A. E. Kaloyeros, and W. A. Lanford, Thin Solid Films 236, 257 (1993).
31. S. P. Murarka and S. W. Hymes, CRC Crit. Rev. Solid State Mater. Sci. 20, 87 (1995).
32. J. Li and J. W. Mayer, MRS Bull. 18, 52 (1993).
33. Geetha Ramaswamy, A. K. Raychaudhuri, J. Goswami, and S. A. Shivashankar, J. Phys. D. (in press).
34. Intramolecular Diels-Alder and Alder-Ene Reactions, edited by D. Taber (Springer, New York, 1984), p. 61.
35. R. Ireland and M. Willand, J. Am. Chem. Soc. 98, 2868 (1976).