Copper CVD precursors and processes for advanced metallization (Invited lecture)

Microelectronic Engineering

Volumn 37-38, Issue , 1997, Pages 89-95

  Doppelt, Pascal ^a  

^a PSL RESEARCH UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER; FILM GROWTH; MASKS; METALLIC FILMS; METALLIZING; SILANES; SILICA; ULTRAVIOLET RADIATION;

GAS PHASE SILYLATION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0031274067     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(97)00097-X     Document Type: Article

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