High-temperature tensile tests and activation volume measurement of free-standing submicron Al films

Journal of Applied Physics

Volumn 92, Issue 11, 2002, Pages 6612-6615

  Kalkman, A J ^a   Verbruggen, A H ^a   Radelaar, S ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b NETHERLANDS INSTITUTE FOR METALS RESEARCH   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ANALYSIS; HIGH TEMPERATURE EFFECTS; PLASTIC FLOW; SENSITIVITY ANALYSIS; STRAIN RATE; TENSILE TESTING; VOLUME MEASUREMENT;

STEADY-STATE SATURATION;

ALUMINUM;

EID: 0036903935     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1518783     Document Type: Article

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