SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 34, Issue 1, 2002, Pages 445-450

Study of ultrathin silicon oxide films by FTIR-ATR and ARXPS after wet chemical cleaning processes

(6) Rouchon, D a Rochat, N a Gustavo, F a Chabli, A a Renault, O a Besson, P a,b

a CEA LETI (France)

b ST (ST Crolles) (France)

Author keywords

ARXPS; FTIR ATR; SiO2; Suboxides; XPS

Indexed keywords

ANNEALING; CHEMICAL BONDS; CHEMICAL CLEANING; CMOS INTEGRATED CIRCUITS; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SILICA; SILICON WAFERS; SPECTROMETERS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE RESOLVED X RAY PHOTOEMISSION SPECTROSCOPY; DILUTED DYNAMIC CLEANING; FOURIER TRANSFORM INFRARED ATTENUATED TOTAL REFLECTION; SILICON OXIDES; WET CHEMICAL CLEANING;

ULTRATHIN FILMS;

EID: 0036693506 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1335 Document Type: Conference Paper

Times cited : (30)

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