Structural fluctuation of SiO2 network at the interface with Si

Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 268-271

  Sugita, Y ^a   Watanabe, S ^a   Awaji, N ^a   Komiya, S ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; HETEROJUNCTIONS; INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); OXIDATION; REFLECTOMETERS; SILICA; SILICON; STRUCTURE (COMPOSITION); THIN FILMS; VIBRATION MEASUREMENT;

FILM DENSITY; FILM STRUCTURE; FILM THICKNESS; LOCAL VIBRATION PROPERTIES; LONGITUDINAL OPTIC MODE; TRANSVERSE OPTIC MODE; X RAY REFLECTOMETRY;

DENSITY MEASUREMENT (OPTICAL);

EID: 0030564530     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00302-9     Document Type: Article

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